Staff


Alumni

  • Dimitrios Passaras, Simulation and experimental study of atmospheric pressure plasma jets depositing thin films for controlled release of chemical substances, 2023
  • Vasiliki Eleftheria Vrakatselli, Low temperature deposition of functional polycrystalline TiO2 thin films by RF magnetron sputtering, 2022
  • Ioannis Tsigaras, Electrical and Optical Characterization of capacitively coupled plasmas, 2018
  • Giannis Alexiou, Plasma enhanced chemical vapor deposition of silicon thin films and materials’ characterization, 2017
  • Stylianos Vogiatzis, Deposition of nanostructured zirconia films for solid oxide fuel cells, 2014
  • Panagiotis Dimitrakellis, Chemical vapor deposition of hydrogenated microcrystalline silicon using high electron density plasmas, 2014
  • Maria Kostopoulou, Alteration of the surface properties of natural and synthetic fabrics with low and atmospheric pressure plasma, 2009
  • Charalambos Voulgaris, Deposition of silicon oxide films (SiOx) using plasma enhanced chemical vapor deposition for the protection of metallic surfaces from corrosion,2007
  • Eleni Katsia, Hydrogenated silicon thin films deposition in plasma reactors for photovoltaic applications: effect of pressure, chemical composition and external substrate bias on deposition rate and on the transition from amorphous to nanocrystalline, 2006
  • Ahmad Hammad, Chemical deposition of microcrystalline silicon in a plasma reactor: electron heating mechanisms and alternative methods for the deposition rate enhancement, 2004
  • Dimitra- Dafni Papakonstantinou-Pappa, The role of the active gas phase intermediates in the surface modification of polymers during their treatement in RF glow discharges, 2004
  • Spyros Stamou, Application of plasma diagnostic methods in the production of microcrystalline hudrogenated silicon, 1999
  • Nikolaos Spiliopoulos, Power dissipation study in gaseous glow discharges and application in amorphous hydrogenated silicon deposition, 1996
  • Dimitra Gerasimou, Low pressure plasma and metal surface interaction phenomena, 1990